Qnity™ (formerly DuPont™) Official Partner

CYCLOTENE™ 4000 / 6800 / XP-80
Photosensitive Dielectric (Photo BCB Series)

I-line photosensitive Photo BCB formulations offering ultra-low dielectric constant (Low Dk 2.65 / Df 0.0008) and superior thermal stability. Engineered for Wafer-Level Packaging (WLP), Redistribution Layers (RDL), passivation, 2.38% TMAH standard developer compatibility, and 200°C low-temperature curable self-priming ultra-low loss solutions.

Product Overview & Core Technology

CYCLOTENE™ photosensitive dielectric series are premier high-reliability polymers engineered for advanced semiconductor packaging and high-frequency (RF / 5G / 6G) applications, combining ultra-low dielectric constant with exceptionally low moisture absorption.

CYCLOTENE™ BCB Key Performance Metrics
Benchmark vs. Conventional Polyimide (PI)
Dielectric Const. (Dk @1~20GHz)
2.65
22% lower than PI (3.4) (Minimizes RC Delay)
Dissipation Factor (Df @1~20GHz)
0.0008
1/10th of PI (0.01) (Ultra-Low Signal Loss)
Water Absorption (Moisture)
< 0.2%
Prevents dielectric drift from moisture
Thermal Stability (Tg)
> 350 °C
Lead-free solder reflow compatible

4000 & 6800 Series Highlights

  • Low Dielectric Constant (Dk): 2.65 across wide broadband (1 GHz - 20 GHz)
  • Ultra-Low Dissipation Factor (Df): 0.0008 for maximum RF / high-speed signal integrity
  • 6800 Series: High resolution (~1.5:1 Aspect Ratio), standard 2.38% TMAH alkaline developer compatible
  • Superior Thermal Stability: Tg > 350 °C / Ultra-low moisture absorption (< 0.2%)

CYCLOTENE™ XP-80 (Self-priming)

  • Self-Priming Chemistry: Eliminates separate AP3000 adhesion promoter pre-treatment step
  • Low Temperature Curable (200 °C): Significantly mitigates substrate thermal stress and warpage
  • High-Frequency Optimization: Ultra-low loss dielectric for high-speed signal transmission
  • Process Compatibility: PGMEA developer support

Photo-BCB Series Product Comparison & Process Specs

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Series Tone / Developer System Cure Temperature Key Features & Thickness Range
4000 Series Negative / Solvent-based (DS2100/3000) 250 °C Low Dk/Df, 0.8 µm - 30 µm film thickness
6800 Series Negative / 2.38% TMAH Aqueous 210 - 250 °C High resolution (~1.5:1 AR), standard TMAH develop
XP-80 Negative / PGMEA 200 °C (Low-Temp) Self-priming, 200°C cure, ultra-low loss

Target Applications

Advanced Packaging & RDL

  • Fan-Out Wafer Level Packaging (FOWLP) redistribution layer (RDL) dielectric
  • 2.5D / 3D IC interposer dielectric layers
  • Wafer passivation and stress buffer coatings

High-Frequency RF & Photonics

  • 5G / 6G mmWave RF front-end module dielectric
  • GaAs, InP compound semiconductor surface passivation
  • MEMS device capping and encapsulation structures

Technical Inquiry & Sample Request: Photo BCB (4000/6800/XP-80)

Get in touch with our technical sales engineers for datasheets, process guidelines, and sample evaluations.