Qnity™ (formerly DuPont™) Official Partner

CYCLOTENE™ 3000 & 3300
Non-photosensitive Series (3D-IC & Wafer Bonding)

High-purity non-photosensitive BCB formulations designed for 3D-IC, TSV, and permanent / temporary wafer bonding processes. The 3300 series features self-priming chemistry to simplify processing, providing superior thermal stability (>350°C) and exceptional planarization (>90% DOP).

Product Overview & Core Technology

CYCLOTENE™ 3000 & 3300 series are non-photosensitive BCB resins engineered for 3D-IC, permanent and temporary wafer bonding, and TSV applications. The 3300 series incorporates built-in self-priming chemistry, eliminating the separate AP3000 primer coating step.

CYCLOTENE™ BCB Key Performance Metrics
Benchmark vs. Conventional Polyimide (PI)
Dielectric Const. (Dk @1~20GHz)
2.65
22% lower than PI (3.4) (Minimizes RC Delay)
Dissipation Factor (Df @1~20GHz)
0.0008
1/10th of PI (0.01) (Ultra-Low Signal Loss)
Water Absorption (Moisture)
< 0.2%
Prevents dielectric drift from moisture
Thermal Stability (Tg)
> 350 °C
Lead-free solder reflow compatible

CYCLOTENE™ 3000 Series

  • Broad Process Window: Wide curing and processing margin, selective HF vapor etch support
  • Comprehensive Viscosity Range: 3022-35 (14cSt), 3022-46 (52cSt), 3022-57 (259cSt), 3022-63 (870cSt)
  • Superior Planarization: Degree of Planarization >90% and thermal stability >350 °C
  • Low Residual Stress: Minimizes wafer bow and thermal mismatch stress

CYCLOTENE™ 3300 Series (Self-priming)

  • Self-Priming Innovation: Direct coating on substrates without separate AP3000 primer step
  • Hybrid Bonding Optimized: Tailored for polymer hybrid bonding and wafer-level bonding
  • Consistent Properties: Maintains identical Dk (2.65), Df (0.0008), and high shear strength
  • Tact Time Reduction: Streamlines packaging cycle times and increases manufacturing yield

CYCLOTENE™ 3000 Viscosity vs. Thickness Specifications

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Product Code Viscosity (@25°C) Coating Thickness Range Primary Target Applications
3022-35 14 cSt 1.0 - 2.4 µm Ultra-thin planarization & inter-level dielectric
3022-46 52 cSt 2.4 - 5.8 µm Wafer bonding & medium-thickness insulation
3022-57 259 cSt 5.7 - 15.6 µm Thick-film passivation & deep topography planarization
3022-63 870 cSt 9.5 - 26.0 µm 3D-IC thick bonding layer & TSV encapsulation

3D-IC & Bonding Applications

Wafer-to-Wafer (W2W) Bonding

Delivers void-free, highly uniform permanent bonding interfaces under thermal compression, offering exceptional adhesion strength and low defect density.

TSV & Polymer Hybrid Bonding

Optimized for heterogeneous 3D integration where Cu-Cu direct interconnects and polymer dielectric bonding are achieved concurrently.

Technical Inquiry & Sample Request: 3D-IC BCB (3000/3300)

Get in touch with our technical sales engineers for datasheets, process guidelines, and sample evaluations.